期刊信息
Microelectronic Engineering
http://www.journals.elsevier.com/microelectronic-engineering/
影响因子:
2.523
出版商:
Elsevier
ISSN:
0167-9317
浏览:
14027
关注:
0
征稿
Microelectronic Engineering is the premier nano-processing, and nanotechnology journal focusing on fabrication of electronic, bioelectronic, electromechanic and fluidic devices and systems, and their applications in the broad areas of electronics, energy, life sciences, and environment. It covers also the expanding interdisciplinary field of "more than Moore" and "beyond Moore" integrated nanoelectronics and micro-nano systems. Through its unique mixture of peer-reviewed articles, reviews, accelerated publications, short and Technical notes, and the latest research news on key developments, Microelectronic Engineering provides comprehensive coverage of this exciting, interdisciplinary and dynamic new field for researchers in academia and professionals in industry.

The journal addresses the following topics:
a)Micro and Nano fabrication, Processing for Nanoelectronics (Lithography, Self-assembly, Plasma Processing, Metallization, 3D Integration, Related Materials)
b)Nanoelectronic, Photonic, Nanoenergy Devices and Systems (fabrication, application and related materials)
c)Micro - Nano Systems, Devices and Systems for Life Sciences, and Environment (Micro/Nano fluidics, MEMS/NEMS, BioMEMS, Lab on a chip)

In detail the topics covered are as follows:
1. Nanolithography and Nanopatterning
•optical lithography
•EUV lithography and masks
•charged particle based lithography and patterning
•nanoimprint lithography techniques and templates
•maskless lithography
•emerging nanopatterning methods
•limits of nanolithography and nanopatterning

2. Pattern Transfer
•ion technology
•plasma processing: etching, nanotexturing, bonding

3. Materials
•metallization and barrier materials
•silicon on insulators
•dielectrics (low K and high K)
•interconnects
•new resist materials
•nanomaterials for device fabrication
•block copolymers
•polymers and flexible substrates

4. Nanometrology, Inspection and Testing
•electron beam testers
•laser probes
•signal and image processing
•nanometrology
•AFM, Scanning probe measurements

5. Advanced Processing and Nanofabrication
•process integration
•three dimensional integration
•rapid thermal processing
•process modelling and simulation
•equipment modelling
•laser assisted processing
•top-down / bottom-up (self - assembly) nanofabrication

6. Advanced Devices
•nanometer devices for electronics and optoelectronics
•dimension-sensitive device properties
•advanced MOS devices
•vacuum nanoelectronics
•organic and molecular electronics
•mesoscopic devices
•micro- & nanofluidics
•other miniaturized devices for biology, chemistry, medicine

7. Advanced fabrication and characterization for heterogeneous micro- and nanosystems
•electro-mechanical systems (MEMS, NEMS)
•optical systems
•fluidic systems
•biosystems
•lab-on-a-chip

Manuscripts of 5 (five) types are considered:
• Review Articles that inform readers of the latest research and advances in nanoelectronics, nanofabrication, micro-nano systems, and applications,
• Accelerated Publications (Letters) that feature exciting research breakthroughs in the field,
• Regular original research papers
• Short / Technical notes intended for original limited investigations or short description of original industrial or industrially-related research and development work
• News and Opinions that comment on topical issues or express views on the developments in related fields, or comment on previously published work.
最后更新 Dou Sun 在 2022-01-29
相关期刊
CCF全称影响因子出版商ISSN
Journal of Electrical And Electronics Engineering2.339IJRDO2456-6055
Computers & Electrical Engineering3.818Elsevier0045-7906
Microelectronics Reliability1.589Elsevier0026-2714
Cogent EngineeringCogent OA2331-1916
Journal of Electrical and Computer EngineeringHindawi2090-0147
Journal of Control Science and EngineeringHindawi1687-5249
bRequirements Engineering2.273Springer0947-3602
Journal of EngineeringHindawi2314-4904
Nano Communication Networks2.947Elsevier1878-7789
Journal of Cryptographic Engineering Springer2190-8508
相关会议
推荐